During this precursor development,
Technologies developed through this collaboration will help increase performance and reduce energy consumption for the semiconductor devices used in smartphones, computers, and the data centers where demand is to grow well into the future.
Precursors are metal-organic compounds used in chemical vapor deposition (CVD), atomic layer deposition (ALD) and other processes to form thin metal films or metal wiring on substrates. CVD and ALD processes enable the formation of films with superior step coverage on various types of base substrate. These are useful methods for forming films as semiconductors become increasingly miniaturized, with increased structural complexity, and narrower wires with every new generation.
According to research carried out at
When bulk ruthenium is used for vapor deposition, with a temperature as high as 3000 degrees C. However, if it is converted into an organometallic compound of ruthenium precursor, it can be vaporized at low temperatures (between room temperature to 200 degrees C) under vacuum. As a result, the formation of high-quality ruthenium film with excellent step coverage at high productivity is expected. This has been an issue in the past because it is technically difficult to achieve all these characteristics at the same time. With the development of "TRuST" however, it is now possible.
Samples of Shipments of "TRuST" should begin shipping samples are planned to start in
Background and
In the past, the most common wiring materials used for semiconductors were copper, tungsten and cobalt. However, as semiconductors have evolved, there are increasing expectations for the precious metal ruthenium to promote further miniaturization of semiconductors because of its lower resistance and higher durability. With its superior characteristics, ruthenium is also being considered for use in transistor gate electrodes and DRAM capacitor electrodes.
The progress of technologies such as IoT, AI, and 5G over recent years has led to rapidly increasing volumes of digital data used in clouds, smartphones, and computers. Therefore, the need for even greater miniaturization of semiconductors is increasing to enable the creation of devices with higher performance and lower energy consumption. As a specialized manufacturer of precious metals,
With the support of Professor
[1] Chemical vapor deposition (CVD): CVD is a chemical film formation method. It is a method of forming thin metal films on the surfaces of base materials or substrates through a chemical reaction induced and accelerated by directing energy, in forms such as heat, plasma and light, at gaseous vapor material fed into a reaction chamber at pressures between atmospheric pressures to medium vacuum pressures (100-10-1 Pa).
[2] Atomic layer deposition (ALD): Both CVD and ALD are film formation methods that use chemical reactions inside reaction chambers to deposit material onto substrates through the vapor phase. The main difference between the two methods is that while CVD continually forms atomic and molecular layers, ALD forms the layers intermittently one layer at a time.
[3] Precursors: Precursors are compounds used as the raw material for forming thin metal films and metal wiring on substrates.
Headquarters: 22F,
Representative:
Founded: 1885
Incorporated: 1918*
Capital:
Employees in consolidated group: 5,138 (FY2019)
Employees: 221 (
Net sales of consolidated group:
Main businesses of the group: The holding company at the center of TANAKA Precious Metals responsible for strategic and efficient group management and management guidance to group companies.
URL: https://www.tanaka.co.jp/english/
*
Headquarters: 22F,
Representative:
Founded: 1885
Incorporated: 1918
Capital:
Employees: 2,393 (as of
Sales:
Main businesses: Manufacture, sales, import and export of precious metals (platinum, gold, silver, and others) and various types of industrial precious metals products.
URL: https://tanaka-preciousmetals.com
About TANAKA Precious Metals
Since its foundation in 1885, TANAKA Precious Metals has built a diversified range of business activities focused on precious metals. TANAKA is a leader in
As precious metal professionals, TANAKA Precious Metals will continue to contribute to the development of an enriching and prosperous society.
The five core companies that make up TANAKA Precious Metals are as follows.
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- TANAKA Kikinzoku Jewerly K.K.
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