Ion Electronic Materials Co., Ltd. Share Price

Equities

6959

TW0006959000

Commodity Chemicals

End-of-day quote Taipei Exchange 03:30:00 17/05/2024 am IST 5-day change 1st Jan Change
116 TWD +0.87% Intraday chart for Ion Electronic Materials Co., Ltd. -21.09% -0.85%
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Financials

Sales 2022 94Cr 2.93Cr 244.24Cr Sales 2023 47Cr 1.46Cr 121.46Cr Capitalization 393.81Cr 12Cr 1.02TCr
Net income 2022 10Cr 32.65L 27Cr Net income 2023 8.8Cr 27.36L 23Cr EV / Sales 2022 * -
Net cash position 2022 57Cr 1.76Cr 146.68Cr Net cash position 2023 21Cr 65.6L 55Cr EV / Sales 2023 7.94 x
P/E ratio 2022 *
-
P/E ratio 2023
45 x
Employees 23
Yield 2022 *
-
Yield 2023
1.04%
Free-Float 97.03%
More Fundamentals * Assessed data
Dynamic Chart
1 day+0.87%
1 week-21.09%
Current month-32.56%
1 month-31.76%
3 months-3.33%
6 months+3.11%
Current year-0.85%
More quotes
1 week
112.50
Extreme 112.5
146.00
1 month
112.50
Extreme 112.5
183.00
Current year
100.00
Extreme 100
183.00
1 year
89.70
Extreme 89.7
191.00
3 years
89.70
Extreme 89.7
191.00
5 years
89.70
Extreme 89.7
191.00
10 years
89.70
Extreme 89.7
191.00
More quotes
Date Price Change Volume
17/24/17 116 +0.87% 643,651
16/24/16 115 -6.88% 922,541
15/24/15 123.5 -1.59% 369,973
14/24/14 125.5 -6.34% 1,538,487
13/24/13 134 -8.84% 1,175,799

End-of-day quote Taipei Exchange, May 17, 2024

More quotes
Ion Electronic Materials Co Ltd is engaged in the provision of specialty gases and machineries. The Company's businesses include the production and sales of special gases and machineries. Special gases include dopant gas, clean and etchant gas, CVD thin-film gas and laser litho gas. Dopant gas are used as special gases for semiconductor ion implantation process and after implantation, including arsine, phosphine, boron trifluoride (11B), 11B enriched boron trifluoride and germanium tetrafluoride. Clean and etchant gas are nitrogen trifluoride, used as cleaning gas in semiconductors and liquid crystal panels, as well as F2/N2 Mixture Gas, used in electronics, laser technology and medical equipment. CVD thin-film gas includes SiH4, Si2H6, DCS and TCS used in semiconductor. Laser litho gas includes ArF193nm, KrF248nm, laser annealing gas, Ne and Kr used in photoresist process. Machineries are used for special gas refilling.
More about the company
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