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This announcement is for information purposes only and does not constitute an invitation or offer to acquire, purchase or subscribe for any securities of the Company.

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SHANGHAI TONVA PETROCHEMICAL CO., LTD.*

(a joint stock company incorporated in the People's Republic of China with limited liability)

(Stock code: 1103)

UPDATES ON TUE PLACING AGREEMENT IN RELATION TO TUE PLACING OF NEW H SHARES UNDER GENERAL MANDATE

Reference is made to the announcements of Shanghai Tonva Petrochemical Co., Ltd. (the "Company") dated 2 May 2013, 28 June 2013, 30 August 2013 and 31 October 2013 (collectively the "Announcements") in relation to, among other things, the entering into the supplemental placing agreement in respect of the placing of an aggregate of up to 70,000,000 new H shares of the Company. Unless otherwise defined, capitalised terms used herein shall have the same meanings as those defined in the Announcements.
As at the date of this announcement, the approvals from the CSRC, being one of the conditions of the Placing Agreement, is yet to be obtained. Due to the uncertainty as to the timing of obtaining such approvals, the Company and the Placing Agent for the time being mutually agreed not to further renew the Placing Agreement on 31 December 2013. As at the date of this announcement, no Shares have been allotted and issued pursuant to the Current Generai Mandate.
The Company and the Placing Agent may consider entering into a new placing agreement as and when CSRC grants the relevant approvai taking into account of the then market conditions. The Company will keep the market informed by way of announcement in compliance with the requirements of the Listing Rules as and when appropriate.
By Order of the Board

Shanghai Tonva Petrochemical Co., Ltd.

Qian Wenhua

Chairman

Shanghai, PRC, 31 December 2013

As at the date of this announcement, the Board comprises 3 executive Directors: Qian Wenhua, M o Luojiang and Li Hongyuan; l non-executive Director: Chan Cheuk Wing Andy; and 3 independent non-executive Directors: Chung Cheuk Ming, Pan Min and Zhou Jianhao.

* Far identification purposes only

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